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退火温度对ZnO陶瓷薄膜低压压敏特性的影响
Effect of annealing temperature on the electrical properties of low voltage ZnO-based ceramic film
【摘要】 应用新型溶胶-凝胶法制备了ZnO陶瓷薄膜,研究了退火温度对ZnO陶瓷薄膜低压压敏电阻电性能的影响.结果表明,采用溶胶掺杂在550℃退火条件下可形成Zn7Sb2O12及ZnCr2O4相,且在退火温度范围内(550-950℃)基本上没有焦绿石相形成.当退火温度达到750℃以后,Sb2O3已全部转变为稳定性好的尖晶石相,同时存在Bi2O3、ZnO的挥发.采用适当的退火温度,可得到具有优良电性能的ZnO陶瓷薄膜低压压敏电阻,其压敏电压低于5V,非线性系数可达20,漏电流密度小于0.5μA /mm2.
【Abstract】 The effect of annealing temperature on the electrical properties of low voltage ZnO-based ceramic film was investigated. The results show that Zn7Sb2O12 and ZnCr2CO4 phases can be formed at a lower annealing temperature (550 ℃) by the solution doping, and the pyrochlore phase is not detected by XRD from 550 ℃ to 950 ℃. Sb2O3 can be changed to spinel phase completely, and Bi2O3, ZnO may be vaporized when the annealing temperature reaches 750 ℃. The ZnO-based ceramic films with nonlinearity coefficient 20, nonlinear voltage 5 V and the leakage current density 0.5 μA/mm2 can be obtained by the proper annealing temperature.
- 【文献出处】 材料研究学报 ,Chinese Journal of Materials Research , 编辑部邮箱 ,2005年01期
- 【分类号】TM28
- 【被引频次】18
- 【下载频次】286