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经PPh3修饰的Rh/SiO2催化剂的吸附-脱附性能
Adsorption-Desorption Behavior of Rh/SiO2 Catalyst Modified with PPh3 Ligand
【摘要】 应用程序升温技术研究了氢甲酰化反应物CO,H2和C2H4在经PPh3修饰的Rh/SiO2(PPh3-Rh/SiO2)催化剂上的吸附-脱附行为.CO-TPD结果显示,Rh/SiO2催化剂在348,398和525 K处有3个脱附峰,PPh3-Rh/SiO2催化剂仅在368 K处出现脱附峰,表明催化剂的吸附性能发生了明显变化.采用原位红外光谱研究了PPh3-Rh/SiO2催化剂上CO的吸附态.结果表明,2 040 cm-1处吸收峰归属于PPh3修饰的Rh粒子上线式吸附的CO.这种吸附态既不同于Rh/SiO2多相催化剂表面Rh粒子上的CO吸附态,也不同于相应均相催化剂中的羰基配位态.TPD和FT-IR结果表明,在低压下PPh3-Rh/SiO2催化剂对氢甲酰化反应已具有相当的催化性能.
【Abstract】 The temperature-programmed desorption(TPD) was employed to investigate the adsorption-desorption behavior of CO,H2 and C2H4 on the Rh/SiO2 catalyst modified with PPh3 ligand(PPh3-Rh/SiO2).The result showed that there were three CO desorption peaks at 348,398 and 525 K on Rh/SiO2,while only one CO desorption peak at 368 K was observed on PPh3-Rh/SiO2.Analogously,only one desorption peak of H2 and C2H4 appeared on PPh3-Rh/SiO2.These results implied that the adsorption-desorption behavior of CO,H2 and C2H4 on PPh3-Rh/SiO2 was different from that on Rh/SiO2.The adsorption states of CO on PPh3-Rh/SiO2 were studied using in situ FT-IR technique.The result revealed that the IR absorption peak at(2?040) cm-1,corresponding to the CO-TPD desorption peak at 368 K on PPh3-Rh/SiO2,was assigned to the linear CO state on the surface PPh3-modified Rh particles.This adsorption-desorption behavior of CO on PPh3-Rh/SiO2 was not only different from that of Rh/SiO2,but also distinguished from that of carbonyl on homogeneous catalysts.The TPD and FT-IR results indicated that the PPh3-Rh/SiO2 had catalytic performance for hydroformylation at lower pressure.
【Key words】 hydroformylation; triphenyl phosphine; rhodium; supported catalyst; adsorptiondesorption;
- 【文献出处】 催化学报 ,Chinese Journal of Catalysis , 编辑部邮箱 ,2005年10期
- 【分类号】O643.361
- 【被引频次】2
- 【下载频次】202