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热处理工艺对合金薄膜电阻及其稳定性的影响
Effects of heat treatment process on alloy thin film resistance and its stability
【摘要】 利用离子束溅射镀膜技术,在17-4PH不锈钢弹性衬底上直接溅射SiO2绝缘膜和NiCr薄膜,制备了一种新型的压力传感器用合金薄膜。分析了热处理工艺对合金薄膜电阻稳定性的影响,对NiCr薄膜电阻进行了4种热处理工艺,获得了使合金薄膜电阻长期稳定的热处理工艺参数在SiOx和N2的保护下,673K退火1h,并在473K下保温24h。用该工艺能制备适应各种恶劣环境的高精度压力传感器。
【Abstract】 Alloy thin film for advanced pressure sensors is manufactured by means of ion-beam sputtering SiO2 insulation film and NiCr thin film on the 17-4PH stainless steel elastic substrate.The effects on stability of thin film alloy resistance are thoroughly analyzed.The NiCr thin film resistance is respectively heat-treated by four processes,and paramaters of heat treatment that make thin film resistance stable are obtained.The thin film resistance is heat-treated under protection of SiOx and N2 at 673K for 1h,then it is kept at 473K for 24h.Pressure sensors of high precision for harsh environments can be manufactured by this process.
【Key words】 thin film alloy resistance; pressure sensors; heat treatment; stability;
- 【文献出处】 传感器技术 ,Journal of Transducer Technology , 编辑部邮箱 ,2005年07期
- 【分类号】TG156
- 【被引频次】10
- 【下载频次】242