【摘要】 重点介绍新近开发的用于单、双面深度曝光的URE-2000S新型紫外光刻设备的技术背景、工作原理、结构组成、技术措施以及总体性能。该设备采用了国内首创的CCD图像底面对准技术、单曝光头实现双面对准曝光,具有双面套刻对准精度高、操作简单、工作高效等优点。实验表明,该设备总体性能处于国产双面光刻的先进水平,接近国外同类产品水平。更多还原

【Abstract】 The technology infrastructure,operating principle,configuration,technology solutions and all performances of URE-2000S-a new UV depth-lithography system successfully developed lately used in single & double-side exposure are stressed. This system used CCD images bottom-side alignment technology of double-side exposure carried out by one exposure head. The results show that the performances of the tool are leading-edge at home and nearly reached the same level as that abroad.更多还原