【摘要】 采用电化学阻抗谱技术研究不锈钢电极上氨络合物体系电积镍的阻抗行为。结果表明 ,氨络合物体系电积镍阻抗谱有 3个时间常数 ,即高频区双电层电容和电化学反应电阻引起的容抗弧 ,中频区中间吸附产物NiOHads弛豫过程引起的感抗弧 ,低频区吸附氢原子对镍电结晶阻滞作用引起的容抗弧。探讨NiOHads吸附覆盖度与电化学阻抗谱的关系 ,提出电极反应机理和等效电路模型。更多还原

【Abstract】 Electrodeposition mechanism of nickel from leaching solution containing ammonia and chloride is investigated by means of electrochemical impedance spectroscopy. Three time constants for EIS characters are indicated by the results. At high frequency the capacitive loop, it is ascribed to the electrochemical double-layer capacity, at medium frequency the inductive loop is attributed to the relaxation of the electrode coverage by an adsorbed intermediate such as  NiOH ads , and at low frequency the capacitive loop may be due to the inhibition of nickel electrodeposition by adsorbed hydrogen. The relationship between electrode coverage by  NiOH ads  and EIS is discussed, and the mechanism and equivalent circuit of nickel electrodeposition are also proposed on the basis of the analysis of electrochemical impedance spectroscopy.更多还原