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粒子轰击对碳纳米管微结构和场发射性能的影响
Effect of Ion Impinging on Morphology and Field Emission of Carbon Nanotubes
【摘要】 研究了粒子轰击对碳纳米管膜微结构和场电子发射性能的影响。研究结果表明,采用多种等离子体处理碳纳米管能改变其微结构,并显著提高场发射点密度,从而改善场发射性能。随着粒子轰击时间的延长,发射电流先降低,然后又增加甚至超过原始碳纳米管膜的发射电流。我们认为发射性能的变化归功于不同的发射机理:粒子轰击处理后,电子由纳米管尖端发射逐渐变为主要从管体上的纳米瘤发射,致使发射点密度显著增加。
【Abstract】 Effects of ion impinging on the morphology and field electron emission properties of screen-printed carbon nanotube films were investigated. It was observed that the plasma treatment modified the microstructure of carbon nanotubes along with the remarkable increase of emission site density. With the prolongation of ion impinging time, the emission current falls down first, and then rises up to higher than that of from the untreated films. It was proposed that the change of emission characteristics was attributed to the different emission mechanisms. After the treatment, electrons emitted dominantly from the nano-nodes on the tube wall instead of from the nanotube tips.
- 【文献出处】 液晶与显示 ,Chinese Journal of Liquid Crystals and Displays , 编辑部邮箱 ,2004年03期
- 【分类号】TN141
- 【被引频次】9
- 【下载频次】96