【摘要】 采用磁控溅射在聚酰亚胺薄膜以及黄铜等基片上成功制备出Sm-Fe超磁致伸缩功能薄膜,并且较深入地研究了溅射功率、工作气压、靶基距以及沉积不同阶段等主要工艺参数对沉积速率的影响规律。结果表明:随溅射功率的减小和靶基距的增大,会不同程度地引起沉积速率的下降;随着工作气压的增大,最初沉积速率不断增大,当溅射气压增大到一定程度(1.5Pa)时,沉积速率达到最大值,之后随溅射气压的增大,又不断减小;对于黄铜和聚酰亚胺基片,溅射初始阶段的沉积速率低于后面阶段的沉积速率。更多还原

【Abstract】 Giant magnetostrictive thin films of Sm-Fe have been prepared on the polyimide and brass substrates by magnetron sputtering.The effect of different factors,such as sputtering power(W),gas pressure(P), the distance (D) between target and substrate and different phases, on the deposition rate of Sm-Fe films were discussed.The experimental results show the deposition rate decreases as the drop of W or the rising of D or P(when P is over 1.5Pa),but increases as the rising of P when P is below 1.5Pa,the effect of different phases deposited on brass substrate is that the deposition rate of the beginning phase is lower than that of the next phase.更多还原