节点文献
化学浴法沉积SnS薄膜的机理分析
An Analysis of Mechanism of SnS Thin Film Deposited by Chemical Bath
【摘要】 研究了以硫代乙酰胺、三乙醇胺、氯化亚锡和氨水作反应物,氯化铵作缓冲剂,采用化学浴法制备SnS薄膜的化学反应机理,分析了络合剂和氯化铵对反应的影响。结果表明,硫代乙酰胺和氯化亚锡主要为SnS薄膜的形成提供Sn2+与S2-,三乙醇胺作为络合剂可以维持溶液中Sn2+的浓度,氯化铵的加入可使反应液PH值在反应中平稳变化,有利于高品质薄膜的形成。
【Abstract】 This paper studies the deposition mechanism of SnS thin film by chemical bath using triethanolamine(TEA),thioacetamide,SnCl2·2H2O,ammonia(aqeous) as reactants and using NH4Cl(aqeous) as buffer aqeous.The influence of the complexing agent and NH4Cl on the chemical reaction was analyzed.The results indicate that the thioacetamide and the SnCl2·2H2O were the reaction source of Sn2+and S2-that can be used to form SnS thin films,and that the TEA as a complexing agent was able to maintain Sn2+concentration in solution. Adding the NH4Cl can make the PH value of the solution change smoothly in reaction, which was favorable for the formation of high quality SnS thin films.
- 【文献出处】 西安理工大学学报 ,Journal of Xi’an University of Technology , 编辑部邮箱 ,2004年04期
- 【分类号】TB383
- 【被引频次】10
- 【下载频次】295