【摘要】 对以本征Si及重掺杂p型和n型Si作为中间层的Fe Si多层膜的层间耦合进行研究 ,并通过退火 ,增大Fe ,Si之间的扩散 ,分析界面扩散对层间耦合的影响 .实验结果表明 ,层状结构良好的制备态的多层膜 ,Fe ,Si之间也存在一定程度的扩散 ,它是影响层间耦合的主要因素 ,远远超过了半导体意义上的重掺杂 ,使不同种类的Si作为中间层的层间耦合基本一致 .进一步还发现 ,在一定范围内增大Fe ,Si之间的扩散 ,即使多层膜的层状结构已经有了相当的退化 ,Fe Si多层膜的反铁磁耦合强度基本保持不变 .更多还原

【Abstract】 The antiferromagnetic coupling in Fe/Si multilayers was investigated with spacers varying from pure Si to heavy_doped n_type and p_type Si. It was found that interlayer diffusion between Fe and Si occurred even though the multilayers showed well_defined layer structure, and the diffusion dominated the heavy_doped Si, which made no difference at all for the antiferromagnetic coupling with different type of Si. Furthermore, the antiferromagnetic coupling in Fe/Si multilayers still goes on while the diffusion between Fe and Si layers enhanced and the layer structure was degraded to some extent after annealing.更多还原