【摘要】 通过射频磁控溅射法制备了Fe_Si_B_Nb_Cu薄膜 ,采用x射线衍射与M ssbauer谱相结合分析了薄膜的微结构形态 ,研究了不同溅射功率对薄膜微结构的影响 .其结果表明 :在较低溅射功率密度下 ,薄膜为无定型结构 ;随着溅射功率密度升高 ,沉积薄膜无需热处理 ,便呈现出晶态和非晶态的混合相结构 ,晶态为纳米级的α_Fe(Si)和α_Fe(B)固溶体 ;α_Fe(Si)相和α_Fe(B)相的体积分数、微结构组态、磁矩取向及宏观磁性能均随着溅射功率的变化而变化更多还原

【Abstract】 Fe_Si_B_Nb_Cu alloy thin films were deposited by radio frequency (rf) magnetro_sputtering. Their microstructures have been analysed by x_ray diffraction (XRD) and Mssbauer spectrum. The results show that the thin films, prepared by low rf power, are amorphous. With the increase of rf power, the deposited thin films were turned to be a mixted structure composed of nano_crystals and amorphous matrix. The nano_crystals contain α_Fe(Si) and α_Fe(B) solid solutions, which are in nanometer size, their relative volume fractions, atomic assembly features, magnetic moment orientations and macro_magnetic properties are changed under different rf powers.更多还原