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多壁碳纳米管薄膜场发射规律实验研究(英文)

Experimental Investigation into the Field Emission Properties of CNT (multi-wall) film

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【作者】 谭大刚罗宏超

【Author】 TAN Da-gang,LUO Hong-chao(College of Physics Science & Technology,Shenyang Normal University Shenyang 110034,China)

【机构】 沈阳师范大学物理科学与技术学院沈阳师范大学物理科学与技术学院 辽宁沈阳110034辽宁沈阳110034

【摘要】 研究了CVD法定向生长的多壁碳纳米管薄膜的在高电压条件下场发射特性 .我们发现在固定电压条件下发射电流和时间的关系按指数规律减弱 .另一个值得关注的现象是碳纳米管的发射性能的不可恢复性损坏 .电流电压关系也由幂次关系I =aVb 改变为幂次关系I =a(V -V0 ) b′,其中 ,b和b′的值均为 2~ 3.最后讨论了电流减弱的原因

【Abstract】 The field emission property of a CNT (multi-wall) film,which was produced by CVD method with self-oriented,has been investigated under a very high vacuum condition.Certain interesting measurement results are described in this paper.It was found that its emitting current degraded exponentially with the integrated time of voltage applying while a fixed tube voltage was applied.Another notable phenomenon is that as its emitting efficiency decreasing unrecoverly,the Current-Voltage relationship of that sample also changed from a power function as I=aV~b into anther power function as I=a(V-V\-0)~ b′ .Both b and b′ have similar value from 2 to 3.A possible explanation of this degradation is discussed in this paper as well.

  • 【文献出处】 沈阳师范大学学报(自然科学版) ,Journal of Shenyang Normal University(Natural Science) , 编辑部邮箱 ,2004年01期
  • 【分类号】TB383
  • 【下载频次】49
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