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CVD金刚石膜剥离后基底渗铬层的表面形态

Surface Morphology of Chromizing Layer After CVD Diamond Film Delaminated

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【作者】 黄元盛邱万奇罗承萍黄彩娥

【Author】 HUANG Yuan-sheng~1, QIU Wan-qi~2, LUO Cheng-ping~2, HUANG Cai-e~1 (1. Department of Mechano-electronics, Shaoguan University, Shaoguan, 512005 China; 2. Department of Mechano-electronics, South China University of Technology, Guangzhou 510640, China)

【机构】 韶关学院机电系华南理工大学机电系韶关学院机电系 广东韶关512005广东广州510640广东韶关512005

【摘要】 研究了CVD金刚石剥离后基底渗铬层的表面形态以及金刚石的背面形貌。结果发现,以渗铬层为基底在600~900℃之间进行CVD金刚石薄膜沉积后,渗铬层的铬碳化合物层和铬扩散层的厚度都增加了;白亮层的铬浓度比沉积前低;渗铬层硬度梯度因铬的扩散而变得比金刚石沉积前更平缓。

【Abstract】 Surface morphology and microstructure of chromizing layer, and morphology of diamond back side were studied after diamond film was delaminated.The results show that after deposition of diamond between 600℃ and 900℃, the thick of chromium-carbon compounds layers and chromizing layers increase; The chromium concentration of chromium-carbon compounds layers decreases; the rigidity of chromizing layers gradually reduces to that of steel substrate.

【基金】 广东省自然科学基金资助项目(990548);韶关学院重点科研资助项目(314-140366)
  • 【文献出处】 热加工工艺 ,Hot Working Technology , 编辑部邮箱 ,2004年08期
  • 【分类号】TG174.444
  • 【被引频次】1
  • 【下载频次】92
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