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染料旋涂工艺中的挥发和流动

Evaporation and flow in the dye coating process

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【作者】 岳宏达潘龙法徐端颐

【Author】 YUE Hongda, PAN Longfa, XU Duanyi(Department of Precision Instruments and Mechanology, Tsinghua University, Beijing 100084, China)

【机构】 清华大学精密仪器与机械学系清华大学精密仪器与机械学系 北京100084北京100084北京100084

【摘要】 染料旋涂是高密度可录光盘复制工艺中的核心部分,其流体流动的力学机制分析属于旋转圆盘系统理论的最新进展,文中分析了染料旋涂中复合溶剂的挥发对流体流动的影响。利用牛顿流体旋涂模型和旋涂溶剂挥发模型进行仿真实验,并对过渡点位置进行修正。依托实际光盘复制生产线进行离线旋涂实验。根据仿真实验和生产线旋涂实验提出染料旋涂的工艺模型:无溶剂挥发、无流体流动的下料阶段;无溶剂挥发、有流体流动的扩散阶段;有溶剂挥发、无流体流动的甩干阶段。利用工艺模型优化染料旋涂工艺,实现生产线的闭环控制。

【Abstract】 Dye coating is the key process in the production of recordable optical discs. Flow analysis of the dye solution on the disk can improve disk quality. Evaporation of the complex solvent will also affect the fluid flow. Emslie’s Newtonian fluid coating model and Meyerhofer’s evaporation model were used to develop a numerical simulation. The transition point in Meyerhofer’s theory was corrected for the disk conductions observed in dye coating experiments. The simplified coating process model in the simulations and the experiments show that the process can be divided into a deposition stage without evaporation and flow, a spreading stage with only flow, and a drying stage with only evaporation. The model has been used for closed process loop control.

【基金】 国家"九七三"重点基础研究项目(G19990330)
  • 【文献出处】 清华大学学报(自然科学版) ,Journal of Tsinghua University(Science and Technology) , 编辑部邮箱 ,2004年02期
  • 【分类号】TQ639.2
  • 【被引频次】22
  • 【下载频次】457
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