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等离子体辅助热丝化学气相沉积金刚石复合膜
Plasma-assisted Hot-filament Chemical Vapor Deposition of Diamond Composite Film
【摘要】 运用等离子体辅助热丝化学气相沉积设备分别进行了金刚石膜和金刚石 /碳化钛复合膜的沉积。实验条件 :甲烷流量与氢气流量比为 1∶5 0 ,基体温度 860℃ ,等离子体偏压 30 0V ,沉积气压 4kPa。运用扫描电子显微镜 (SEM )分别观察了沉积膜的表面和断面形貌 ;运用能量扩散电子谱 (EDX)对沉积的复合膜进行分析 ,观察到Ti元素峰和C元素峰 ;运用X射线衍射 (XRD)得到相应的金刚石衍射峰和碳化钛衍射峰。实验表明 ,用等离子体辅助热丝化学气相沉积法可以制备出晶型良好的金刚石复合膜
【Abstract】 Diamond film and diamond/TiC composite film were coated by plasma-assisted hot-filament chemical vapor deposition. The deposition temperature was 860℃.The ratio of feed gas was CH (4)∶H (2) =1∶50. The bias-voltage of plasma was 300V and the deposition pressure was 4 KPa. The film characteristics were analyzed by SEM, EDX and XRD. It showed that good diamond composition film could be prepared by plasma-assisted hot-filament chemical vapor deposition.
【基金】 山东省自然科学基金项目 (Y2 0 0 1F10 )
- 【文献出处】 青岛科技大学学报(自然科学版) ,Journal of Qingdao University of Science and Technology , 编辑部邮箱 ,2004年04期
- 【分类号】TB43
- 【下载频次】160