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LIA注入器发射度增长机理研究及其抑制措施
Mechanism and Control Methods of Emittance Growth for LIA Injector
【摘要】 根据直线感应加速器 (LIA)的特点采用了轴对称直流模型 ,结合E .P .Lee的理论导出了发射度增长的微分方程 ,提出了一种直线感应加速器发射度增长的机理 ,根据该机理计算了从均匀分布到高斯分布的演变过程中发射度增长的大小 ,指出直线感应加速器 (LIA)注入器阶段束流发射度增长主要是由于非线性效应导致的束刨面电流密度分布变化引起的 .根据研究结果 ,提出了相应的抑制发射度增长的措施 .
【Abstract】 According to characteristics of Linear Induction Accelerator(LIA),the model of cylindrically symmetric DC beams is adopted in this paper.The differential equation of RMS emittance growth is derived.One of the emittance growth mechanism is presented,which assumes that the beam profile will not stop evolving unless it has Gaussian distribution due to non-linearity during beam transportation.Consequently,the emittance growth is calculated from K-V distribution to Gaussian distribution,and the control methods of emittance growth is discussed.
【Key words】 LIA; cylindrically symmetric DC beams; emittance growth; control methods;
- 【文献出处】 高能物理与核物理 ,High Energy Physics and Nuclear Physics , 编辑部邮箱 ,2004年09期
- 【分类号】TL53
- 【被引频次】4
- 【下载频次】44