【摘要】 深入研究了克拉霉素合成中各保护基的脱除反应,发现2′ 和4″ 羟基上的三甲基硅保护基(TMS)和9 肟羟基上的醚化保护基(1 乙氧基环己基)的脱除是分步进行的,温度和pH是影响各个保护基脱除的主要因素。pH=4 6时,常温下反应1h可以脱去两个TMS保护基,而在升温回流的条件下反应0 5h才可以脱去醚化保护基。实验中还发现2′ 和4″ 羟基上的TMS保护基在同一反应条件下对不同的酸的敏感性是不同的。作者分离纯化了脱去各个保护基的反应中间体并进行了结构表征。更多还原

【Abstract】 In the synthesis of clarithromycin,the protective groups at 2′-,4″- and 9- position were removed step by step,in which the temperature and pH value were two main factors.It was found that the sensitivity of two TMS groups at 2′- and 4″-position under the same reaction conditions but with different acids was different.The intermediates produced during the deprotective reaction were separated and characterized by ¹H ¹³C NMR and MS.更多还原