【摘要】 讨论了步进扫描投影光刻机中的曝光剂量控制技术 ,详细阐述了步进扫描投影光刻机中的曝光剂量控制原理 ,提出了一种曝光剂量控制算法。实验表明 ,应用此剂量控制技术使系统的曝光剂量控制精度达到 1.3 7% ,剂量重复精度达到 0 .3 1% ,满足亚半微米光刻图形的曝光剂量控制要求更多还原

【Abstract】 Exposure dose control technique in step-and-scan exposure system is discussed.Dose control principle for step-and-scan system is analyzed.A pulse-to-pulse dose control algorithm is proposed.Dose accuracy of 1.37% and dose repeatability of 0.31% are obtained using this dose control technique.Experiment results indicate that this dose control technique meets the requirement of sub-half-micron lithography.更多还原