【摘要】 以硅烷和氧化二氮作为反应气体 ,采用等离子体增强化学气相沉积 (PECVD)技术 ,不使用掺杂 ,在单晶硅衬底上制备了用于平面光波导的二氧化硅薄膜。研究了薄膜折射率和淀积速率与工艺参量之间的关系 ,通过棱镜耦合仪、傅里叶变换红外光谱、原子力显微镜等测试手段 ,分析了薄膜的结构和光学特性。结果表明 ,实验能快速生长厚二氧化硅薄膜 ,薄膜表面平整 ,颗粒度均匀 ,同时薄膜具有折射率精确可控和红外透射性能好的特点 ,非常适合制作光波导器件。更多还原

【Abstract】 Without doping,plasma enhanced chemical vapor deposition （PECVD） of silica films on Si substrates with gas mixtures of SiH₄ and N₂O is considered. Various factors affecting the refractive index and the deposition rate of the deposited film are studied in order to optimize the growth process of the films. The microstructures and optical properties of the films are examined by a prism coupler,a Fourier transform infrared spectroscopy （FTIR） and an atom force microscopy （AFM）. The results show that a thick film with a uniform surface and small loss for infrared light can be rapidly deposited by the PECVD technology and refractive index of the film can be controlled accurately.更多还原