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Static recording characteristics of new type super-resolution near-field structure

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【作者】 张锋徐文东王阳魏劲松周飞高秀敏干福熹

【Author】 Feng Zhang Wendong Xu Yang Wang Jinsong Wei Fei Zhou Xiumin Gao and Fuxi Gan Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of sciences, Shanghai 201800

【机构】 Shanghai Institute of Optics and Fine MechanicsChinese Academy of sciencesShanghai 201800Shanghai 201800

【摘要】 <正> A novel super-resolution near-field optical structure (super-RENS) with bismuth (Bi) mask layer is proposed in this paper. Static optical recording tests with and without super-RENS are carried out using a 650-nm semiconductor laser at recording powers of 14 and 7 mW with pulse duration of 100 ns. The recording marks are observed by high-resolution optical microscopy with a charge-coupled device (CCD) camera. The results show that the Bi mask layer can also concentrate energy into the center of a laser beam at low laser power similar to the traditional Sb mask layer. The results above are further confirmed by another Ar~+ laser system. The third-order nonlinear response induced by the plasma oscillation at the Bi/SiN interface during laser irradiation can be used to explain the phenomenon. The calculation results are basically consistent with our experimental results.

【Abstract】 A novel super-resolution near-field optical structure (super-RENS) with bismuth (Bi) mask layer is proposed in this paper. Static optical recording tests with and without super-RENS are carried out using a 650-nm semiconductor laser at recording powers of 14 and 7 mW with pulse duration of 100 ns. The recording marks are observed by high-resolution optical microscopy with a charge-coupled device (CCD) camera. The results show that the Bi mask layer can also concentrate energy into the center of a laser beam at low laser power similar to the traditional Sb mask layer. The results above are further confirmed by another Ar~+ laser system. The third-order nonlinear response induced by the plasma oscillation at the Bi/SiN interface during laser irradiation can be used to explain the phenomenon. The calculation results are basically consistent with our experimental results.

【关键词】 recordingbismuthcamerairradiationmarksdiametersnanometerpowersoscillationexplain
【基金】 This work was supported by the National "863" Project of China (No. 2002AA313030), the National Natural Science Foundation of China (No. 60207005), and Science and Technology Committee of Shanghai (No. 022261045, 03QG14057)
  • 【文献出处】 Chinese Optics Letters ,中国光学快报(英文版) , 编辑部邮箱 ,2004年10期
  • 【分类号】O432.2
  • 【被引频次】1
  • 【下载频次】42
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