【摘要】 在化学镀Ni P合金碱性镀液中 ,使用较强的配合剂来防止镍离子的水解沉淀 ,同时用氨 氯化铵缓冲体系来维持镀液的pH值。由于镍 氨配合物的配合常数相对较小 ,通常认为氨并不参与配合作用 ,可是实际的一些实验现象无法得到合理解释。Touhami等人提出了镍 柠檬酸一氨三元配合物的放电机理 ,却未能提供该三元配合物存在的证据。利用紫外可见光谱研究了柠檬酸 氯化铵碱性Ni P合金镀液中镍离子的配合物 ,结果表明除了镍 柠檬酸配合物的存在以外还有镍 柠檬酸 氨配合物的存在。在系统研究柠檬酸盐和氨两种配体对吸收光谱影响的基础上 ,推断得出该三元配合物为Ni(Ⅱ ) (C6 H5O3-7) (NH3) 3。更多还原

【Abstract】 A strong complex agent is normally used in the alkaline chemical plating solution for Ni-P plating in order to prevent Ni ion from precipitation by hydrolysis. To keep a stable pH condition, an NH 3-NH 4Cl buffer system is used. Traditionally, it is considered that NH 3 does not participate in the complex because of the relatively low Ni-NH 3 complexing constant, but some experimental results cannot be explained reasonably. Touhami etc. have proposed a ternary Ni-citrate-NH 3 complex involved in the discharge process, however they cannot give the direct support on the presence of this complex in solution. In this paper, a UV-Vis spectrometric study was carried out to identify the nickel complex in the Ni-P plating solution, and the results indicated the presence of both Ni-cit binary complex and Ni-cit-ammonia ternary complex. After the systematic investigation of the dependence of UV-Vis spectra on the two ligands (cit and ammonia), the composition of this Ni-cit-ammonia ternary complex was supposed to be Ni(Ⅱ)(C 6H 5O 3- 7)(NH 3) 3.更多还原