【摘要】 在不同的沉积温度下,利用CHF₃和C₂H₂为气体源,在微波电子回旋共振等离子体化学气相沉积（ECR-CVD）系统中制备了氟化非晶碳（a-C:F）薄膜,为了研究其热稳定性,薄膜在500℃的真空中作了退火处理。测量了退火前后其电学、光学性质的变化,使用FTIR、Raman、XPS方法考察了其结构随沉积温度的变化,分析了性质同结构之间的关联。结果表明,在高的沉积温度下制备的薄膜中的F/C比较低,CF₂和CF₃键成分较少而以CF键成分为主,其交联程度高,因而具有较好的热稳定性。更多还原

【Abstract】 Fluorinated amorphous carbon films （a-C: F） were prepared at different temperatures by using a microwave electron cyclotron resonance chemical vapor deposition （ECR-CVD） reactor with CHF₃ and C₂H₂ as source gases. Films were annealed at 500℃ in vacuum ambience in order to investigate their thermal stability. The changes of structural, optical and electrical properties with deposition temperature were investigated. Results indicate that films deposited at high temperature have less CF_x bonding and more cross-linking structures, thus they have a better thermal stability. The loss of fluorine may result in the increasing of dielectric constant.更多还原