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热双金属稳定化热处理效果的电阻分析

Effect analysis of thermal bimetal during stability thermal treatment through resistance

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【作者】 倪华文玉华严密张忠民

【Author】 NI Hua~1, WEN Yu-hua~1, YAN Mi~1, ZHANG Zhong-min~2ngzhou 310027, China;2.Shanghai Iron and Steel Research Institute, Shanghai 200940,China)

【机构】 浙江大学硅材料国家重点实验室上海钢铁研究所 浙江杭州310027浙江杭州310027上海200940

【摘要】 通过电阻和X Ray衍射分析方法,研究了热双金属5J20110及其组元在稳定化热处理过程中电阻率和残余应力随循环次数的变化。研究结果表明经第一次循环热处理后,热双金属的残余应力下降最显著,与合金电阻率的变化趋势相同。通过电阻率的分析可以确定稳定化热处理的效果。

【Abstract】 The resistivity and the residual stress of thermal bimetal 5J20110 and its components as a function of stability thermal cycling times were investigated by means of the resistance and X-ray diffraction methods. The results show that,after the first stability thermal cycling,the decrease of residual stress in 5J20110 was the largest, which was the same as the dependence of resistivity on stability thermal cycling times. The effect of stability thermal cycling treatment can be evaluated through the analysis of resistivity.

【基金】 国家自然科学基金资助项目(50171065)
  • 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,2004年05期
  • 【分类号】TG156
  • 【被引频次】1
  • 【下载频次】150
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