【摘要】 不锈钢箔片上溅射沉积25nm的钛底膜后,在工作真空0.9Pa,O2、Ar分压比1∶6,基体温度270～280℃的条件下,用直流磁控反应溅射法制备了厚度约300nm的TiO2薄膜,并在420℃的氧气氛下进行热处理。XRD分析看出,薄膜为TiO2锐钛矿和金红石复合晶型。测算表明TiO2复合晶中锐钛矿质量含量约64%,其晶粒尺寸约14nm。用"弯曲法"测试表明,膜基结合力强。由对苯酚溶液的降解实验看出,制备光催化薄膜具有较好的光催化活性。更多还原

【Abstract】 TiO₂ film with a thickness of 300nm was deposited on stainless steel with a 25nm Ti buffer layer, by DC reactive magnetron sputtering at a pressure of 0.9Pa, the pressure ratio of O₂ to Ar of 1∶6 and the substrate temperature of 270～280℃. The TiO₂ film was thermally treated in oxygen vapor at 420℃, XRD analysis showes that the film was composed of TiO₂ anatase and rutile crystals with the ingredient of anatase of 64% and the size of crystal of 14nm. The bending test states the binding strength between film and substrate was high, the experiment on degrading phenol expresses the film was of phatocatalytic activity.更多还原