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不同沉积工艺下TiN涂层金属学特性的研究

Study of Metallography Characteristic of TiN Coating Deposited by Different Deposition Process

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【作者】 郎平周兰英王永峰

【Author】 Lang Ping Zhou Lanying Wang Yongfeng

【机构】 北京理工大学机械与车辆工程学院北京理工大学北京理工大学 100081北京市在读硕士研究生

【摘要】 采用不同沉积工艺得到的TiN涂层高速钢的物相主次不同 ;涂层宏观残余应力呈压应力状态 ,应力状态主要与膜 /基材料的热力学性能的差别有关 ;不同沉积工艺得到的TiN涂层高速钢的晶粒度约 0 1μm ,其对涂层的耐磨性影响不大 ,微观残余应力对耐磨性起了很大作用 ;不同沉积工艺得到的TiN涂层的点阵参数偏大 ,这主要是由涂层的微观残余应力和原子置换引起的 ;摩擦学实验表明以 ( 111)晶面择优取向的试样的耐磨性最佳

【Abstract】 The XRD patterns of TiN coating deposited by different deposition process are different. The macroscopical residual stress of TiN coating is mainly compressive stress ,and the state of stress is mainly caused by the difference of thermodynamic characteristic between the coating and substrate .The grain size of coating deposited by different process is about 0.1μm, which does not almost affect the wear resistance of coating, but microcosmic residual stress is the main factor . The lattice constant of the coating deposited by different porcess is bigger than normal, which is caused mainly by the microcosmic residual stress of the coating and the replacement of atom. The tests show that the wear resistance of coating with (111)preferred orientation is the best.

【关键词】 TiN涂层残余应力晶粒度点阵参数
【Key words】 TiN coatingresidual stressgrain sizelattice constant
  • 【分类号】TG174.44
  • 【被引频次】3
  • 【下载频次】188
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