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掩模测量人眼波前像差技术研究
Study on the Mask Method for Measuring the Eye’s Wavefront Aberration
【摘要】 对基于Hartmann Shack(H S)原理测量人眼波前像差的掩模技术进行了研究。利用光学系统将液晶显示器(LCD)制成的掩模对应成像在微透镜阵列面,对模拟眼进行测量。设计了针对不同采样密度的H S系统的各类掩模,扩大子孔径内像差测量范围,最大可测像差分别提高到L2/f、2L2/f和4L2/f,解决了光斑溢出和粘连的问题,实现了对大像差人眼的准确测量。
【Abstract】 The method for measuring the eyes wavefront aberration with a movable mask,based on the Hartmann-Shack(H-S) principle,has been investigated.The mask is implemented by an LCD and imaged on the lenslet array plane,by which we measure aberrations of an artificial eye.Masks corresponding to H-S systems with different sampling densities are designed and the maximum measurable wavefront aberrations in subapertures are increased to L~2/f,2L~2/f and 4L~2/f separately.The method solves the problem of spot dislocations and contiguities,where spots leave their subapertures,leading to an expansion of the dynamic range of H-S sensors.
【Key words】 wavefront aberration; Hartmann-Shack(H-S) principle; sensor; mask;
- 【文献出处】 光电子·激光 ,Journal of Optoelectronics.laser , 编辑部邮箱 ,2004年11期
- 【分类号】O439
- 【被引频次】1
- 【下载频次】63