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高铜含量中孔Cu-Si二元氧化物的合成和表征

Synthesis and Characterization of Cu(Ⅱ)-contained MCM41 with High Content of Copper

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【作者】 孔岩陈嘉伊郭宪吉马会宣侯文华颜其洁

【Author】 KONG Yan 1, CHEN Jia-Yi 1, GUO Xian-Ji 1, MA Hui-Xuan 1,2, HOU Wen-Hua 1, YAN Qi-Jie 1* (1. Laboratory of Mesoscopic Materials Science, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China; 2. Shanxi Yuncheng College, Yuncheng 044000, China)

【机构】 南京大学化学化工学院介观材料科学实验室南京大学化学化工学院介观材料科学实验室 南京210093南京210093南京210093山西运城学院运城044000

【摘要】 采用 CTAB(十六烷基三甲基溴化铵 )为模板剂 ,Na2 Si O3· 1 0 H2 O为硅源 ,Cu( NH3) 4( NO3) 2 为铜源 ,在常温下成功地合成出含铜质量分数高达 2 6% ,具有中孔结构的硅基氧化铜复合材料 .较系统地研究了反应时间、温度、 p H值和铜掺入量等对产物性能的影响 .用 XRD,HRTEM,FTIR,BET,TG-DTA,ICP和XPS等手段对合成产物的结构进行了表征

【Abstract】 A series of Cu-containing MCM41 with high contents of copper was synthesized at room temperature by using Na2SiO3 as Si sources and Cu(NH34(NO32 as Cu sources and cetyltrimethyl ammonium bromide(CTAB) as the template. The influence of reaction conditions such as time, temperature, pH value and copper contents upon the structure of the materials was systematically studied. The mesoporous material containing up to 26%(mass fraction) copper was successfully synthesized under the best reaction conditions(t=20 ℃; pH=9—10; t=72 h). The structure of the materials was characterized by XRD, HRTEM, BET, TG-DTA, FTIR, ICP and XPS. The obtained material has a high surface area of 525 m 2/g with a narrow pore distribution at 3.11 nm.

【基金】 国家自然科学基金 (批准号 :2 0 173 0 2 6);南京大学现代分析中心测试基金资助
  • 【文献出处】 高等学校化学学报 ,Chemical Research In Chinese Universities , 编辑部邮箱 ,2004年02期
  • 【分类号】O643.3
  • 【被引频次】4
  • 【下载频次】169
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