【摘要】 准分子激光光刻是21世纪提高超大规模集成电路(VLSI)集成度的一项关键技术,而近年来基于准分子紫外光源制作光纤布拉格光栅元件(FBG)的技术日益成为国内外的研究热点。本文简述了准分子激光光刻的研究现状和光纤布拉格光栅的应用,详细介绍了利用紫外激光制作FBG的技术和相应准分子激光光源关键技术的发展。更多还原

【Abstract】 Excimer laser lithography is the key technology to improve VLSI integrity scale in 21 century, and fabrication of Fiber Bragg Grating (FBG) based on excimer laser irradiation become the research hotspot in home and abroad. This paper briefly introduced lithography status and applications of FBG, and discussed the formation technology of FBG with UV source and the crucial technological development trends about excimer laser.更多还原