节点文献
电子-离子双束纳米工作站
Electron and ion dual beam nanometer working station
【摘要】 现代微电子工业迅猛发展,对电子设备的精度和功能也提出了新的要求。电子-离子双束纳米工作站是扫描电子束和聚焦离子束技术的独特融合,突破了只能对表层成像和分析的局限,它可以对样品进行三维的、表面下的观察和分析,也可以切割、研磨样品材料和沉积特定的材料,用它可以获得以前无法得到的样品信息。该工作站为研究人员和制造人员提供了一种对多种样品在纳米尺度进行修改、制作和分析的有效工具。
【Abstract】 With the rapid development of modern microelectronics industry, the new request to the precision and function of electron equipment is brought forward. By combining the scanning electron beam and focused ion beam technology, a dual beam nanometer working station is set up. It breaks the limit of imaging and analyzing to sample surface. Samples can be observed and analyzed in three dimensions and into the surface. The station can also cut, grind and sedimentate some material on the sample. This nanometer working station offers us the sample information which can’t be obtained formerly and an efficient tool which can amend, make and analyze multi-samples with nanometer dimensions.
【Key words】 Scanning electron beam; Focused ion beam; Microelectronic techniques;
- 【文献出处】 光电工程 ,Opto-electronic Engineering , 编辑部邮箱 ,2004年S1期
- 【分类号】TB383
- 【下载频次】95