【摘要】 电子束曝光机的偏转系统控制电子束偏转扫描。像差低、偏转灵敏度高、扫描速度快是它的基本要求。对各种偏转器、偏转方式进行分析、比较,从偏转器空间场的数值计算方法、偏转系统的优化、像差校正、偏转器制作工艺、电气参数等方面阐述设计过程和工程实现上一些值得注意的问题。综合考虑偏转器和偏放电路的设计可以得到最优性能的系统。更多还原

【Abstract】 The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam. The basic demands of the system should be of low aberration, high deflection sensitivity and fast scanning speed. Analysis and comparison for various deflectors and deflection modes are carried out. The design process and some problems that must be paid attention in engineering stage are described from numerical calculation of deflector spatial field, optimization of the deflection system, aberration correction, manufacturing process of deflector and electrical parameters, etc. A system with optimal performance can be obtained through comprehensively taking account of the design of deflector and deflection-amplification circuit.更多还原