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2-氯酚水溶液的脉冲辐解研究

Study on the pulse radiolysis of 2-chlorophenol aqueous solutions

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【作者】 刘士姮汪世龙孙晓宇李文哲倪亚明王文峰王敏姚思德

【Author】 LIU Shiheng WANG Shilong SUN Xiaoyu LI Wenzhe NI Yaming (Test Center, Tongji University, Shanghai 200092) WANG Wenfeng WANG Min YAO Side (Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800)

【机构】 同济大学测试中心中国科学院上海应用物理研究所中国科学院上海应用物理研究所 上海200092上海200092上海201800上海201800

【摘要】 利用脉冲辐解技术对 2-氯酚水溶液在多种条件下的降解行为进行了详细研究。对瞬态光谱中的主要吸收作了归属,并考察了这些瞬态产物的生成和衰减动力学。研究表明,在不同 pH 值下,2-氯酚与?OH 的反应途径不同:中性条件下主要生成羟基加成物,其生成速率常数为 8.3×109dm3?mol-1?s-1;碱性条件下,则主要发生电子转移形成 2-氯代酚氧基,同时存在羟基加成物脱 HCl 和脱 OH-过程。?N3与 2-氯酚发生单电子氧化,形成 2-氯代酚氧基。?H 与 2-氯酚发生加成反应生成环己二烯类氢加成物,其速率常数为 2.5×109dm3 ? mol-1 ? s-1。eaq 与 2-氯酚发生电子转移,生成羟苯基和氯离子,碱性条件(pH=11)和中性条件下的速率 -常数分别为 3.5×108 dm3?mol-1?s-1和 2.2×109 dm3?mol-1?s-1。该结果有助于人们进一步了解氯酚降解的本质,从而为该类化合物的降解处理提供了理论基础。

【Abstract】 The kinetics and mechanisms of the reactions of 2-chlorophenol with hydroxyl radical, azide radical, hydrogen atom and hydrated electron have been studied using pulse radiolysis. In neutral solutions, relatively stable hexadienyl type OH-adducts is formed upon the addition of hydroxyl radical to the aryl ring of the substrate. In alka- line solutions, 2-chlorophenoxyl radical and semi-quinone radical anion are formed through the electron transfer from the substrate to hydroxyl radical as well as OH-addition followed by HCl/OH- elimination. Azide radical oxidizes 2-chlorophenol via one-electron transfer, forming correspondent o-chloro-phenoxyl radical. Hydrogen atom reacts with the substrate via the addition to the aryl ring, forming hexadienyl type ?H-adducts. Under the attack of hydrated electron, 2-chlorophenol undergoes reductive Cl- elimination, with the rate constant of 3.5×108 dm3?mol-1?s-1in alka- line solution and 2.2×109dm3?mol-1?s-1in neutral solution respectively. These results shed light on the degradation mechanism of chlorophenols and provide theoretical foundation for treatments of wastewater contaminated with chlorophenols.

【基金】 国家自然科学基金(20077019,10175086)资助
  • 【文献出处】 辐射研究与辐射工艺学报 ,Journal of Radiation Research and Radiation Processing , 编辑部邮箱 ,2004年01期
  • 【分类号】O644
  • 【被引频次】5
  • 【下载频次】106
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