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The Gridless Plasma Ion Source (GIS) for Plasma Ion Assisted Optical Coating

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【作者】 尤大伟李晓谦王宇林永昌

【Author】 You Dawei, Li Xiaoqian, Wang YuLin YongchangCenter for Space Science and Applied Research, The Chinese Academy of Sciences, Beijing 100080,China

【机构】 Center for Space Science and Applied ResearchThe Chinese Academy of SciencesBeijing 100080ChinaChina

【摘要】 <正> High-quality optical coating is a key technology for modern optics. lon-assisted deposition technology was used to improve the vaporized coating in 1980’s. The GIS (gridless ion source), which is an advanced plasma source for producing a high-quality optical coating in large area, can produce a large area uniformity> 1000 mm(diameter), a high ion current density - 0.5mA/cm2, 20 eV - 200 eV energetic plasma ions and can activate reactive gas and film atoms. Now we have developed a GIS system. The GIS and the plasma ion-assisted deposition technology are investigated to achieve a high-quality optical coating. The GIS is a high power and high current source with a power of l kW - 7.5 kW, a current of 10 A - 70 A and an ion density of 200μA/cm2 -500 μA/cm2. Because of the special magnetic structure, the plasma-ion extraction efficiency has been improved to obtain a maximum ion density of 500 μA/cm2 in the medium power (- 4kW) level. The GIS applied is of a special cathode structure, so that the GIS opera

【Abstract】 High-quality optical coating is a key technology for modern optics. lon-assisted deposition technology was used to improve the vaporized coating in 1980’s. The GIS (gridless ion source), which is an advanced plasma source for producing a high-quality optical coating in large area, can produce a large area uniformity>1000 mm(diameter), a high ion current density - 0.5mA/cm2, 20 eV - 200 eV energetic plasma ions and can activate reactive gas and film atoms. Now we have developed a GIS system. The GIS and the plasma ion-assisted deposition technology are investigated to achieve a high-quality optical coating. The GIS is a high power and high current source with a power of l kW - 7.5 kW, a current of 10 A - 70 A and an ion density of 200 μA/cm2 - 500 μA/cm2. Because of the special magnetic structure, the plasma-ion extraction efficiency has been improved to obtain a maximum ion density of 500 μA/cm2 in the medium power (- 4kW) level. The GIS applied is of a special cathode structure, so that the GIS operation can be maintained under a rather low power and the lifetime of cathode will be extended. The GIS has been installed in the LPSX-1200 type box coating system. The coated TiO2, SiO2 films such as antireflective films with the system have the same performance reported by Leybold Co, 1992, along with a controllable refractive index and film structure.

  • 【文献出处】 Plasma Science & Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2004年04期
  • 【分类号】O539
  • 【下载频次】43
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