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硫脲对镍电沉积的作用
Effect of Thiourea on Nickel Deposition
【摘要】 应用循环伏安和阻抗_电位法研究了硫脲(TU)对玻碳电极和镀镍玻碳电极上镍沉积过程的影响.结果表明,在玻碳电极上镍的电沉积呈现明显的电化学成核机理,而在镀镍玻碳电极上则无此特征.TU的存在虽阻碍了Ni晶核的形成,但却能加速晶粒的生长.
【Abstract】 Effect of thiourea on nickel deposition at glassy carbon and nickel-deposited glass carbon electrodes was investigated with cyclic voltammograms and impetance-potential curves. It was found that the nucleation processes occurred at the glassy carbon electrode. However, this characteristics disappeared at the nicked-deposited glassy carbon electrode. It was suggested that the presence of thiourea hindered the nucleation processes, yet accelerated grain growth.Curves of impetance-potential could sensitively detect effect of thiourea on nickel depositon and reflect changes in rate-determining step with potential.
【Key words】 Thiourea; Nickel electrodeposition; Rate-determining step; Impedance-potential curves;
- 【文献出处】 电化学 ,Electrochemistry , 编辑部邮箱 ,2004年01期
- 【分类号】O646
- 【被引频次】23
- 【下载频次】497