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硫脲对镍电沉积的作用

Effect of Thiourea on Nickel Deposition

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【作者】 胡光辉吴辉煌杨防祖王森林

【Author】 HU Guang-hui,WU Hui-huang~,YANG Fang-zu,WANG Sheng-lin ical Chemistry of Solid Surfaces, Xiamen University,Xiamen 361005,China)

【机构】 厦门大学化学化工学院固体表面物理化学国家重点实验室厦门大学化学化工学院固体表面物理化学国家重点实验室 福建厦门361005福建厦门361005福建厦门361005

【摘要】 应用循环伏安和阻抗_电位法研究了硫脲(TU)对玻碳电极和镀镍玻碳电极上镍沉积过程的影响.结果表明,在玻碳电极上镍的电沉积呈现明显的电化学成核机理,而在镀镍玻碳电极上则无此特征.TU的存在虽阻碍了Ni晶核的形成,但却能加速晶粒的生长.

【Abstract】 Effect of thiourea on nickel deposition at glassy carbon and nickel-deposited glass carbon electrodes was investigated with cyclic voltammograms and impetance-potential curves. It was found that the nucleation processes occurred at the glassy carbon electrode. However, this characteristics disappeared at the nicked-deposited glassy carbon electrode. It was suggested that the presence of thiourea hindered the nucleation processes, yet accelerated grain growth.Curves of impetance-potential could sensitively detect effect of thiourea on nickel depositon and reflect changes in rate-determining step with potential.

【基金】 国家自然科学基金(20073035)资助
  • 【分类号】O646
  • 【被引频次】23
  • 【下载频次】497
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