节点文献
兆声清洗技术分析及应用
Megasonic Cleaning technology analysis and application
【摘要】 主要论述兆声清洗技术原理及其在微电子清洗工艺过程中的应用。采用兆声清洗法可以减少化学品和高纯水的用量,在不破坏晶圆表面特征的前提下,提高对亚微细颗粒及各种污染物的去除能力及生产效率。
【Abstract】 The text main discuss the principle of mega-sonic cleaning technology and the use in the technology process of microelectronics. The using of the mega-sonic cleaning can reduce the usage of chemical and ultra-pure water, refrain the surface feature of wafer from injury, and enhance the ability to remove tiny particles and production efficiency.
【关键词】 RCA清洗法、高纯水;
范德瓦尔斯引力;
气穴效应;
兆声清洗;
压电陶瓷晶体;
【Key words】 RCA cleaning; Ultra-purity water; Van der waals force; Acoustic Cavitations; mega-sonic cleaning; Ceramic piezoelectric crystal;
【Key words】 RCA cleaning; Ultra-purity water; Van der waals force; Acoustic Cavitations; mega-sonic cleaning; Ceramic piezoelectric crystal;
- 【文献出处】 电子工业专用设备 ,Equipment For Electronic Products Manufacturing , 编辑部邮箱 ,2004年01期
- 【分类号】TN305
- 【被引频次】8
- 【下载频次】295