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PZT铁电薄、厚膜及其制备技术研究进展

Progress in PZT Ferroelectric Thin or Thick Films and Preparation Technology

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【作者】 夏冬林刘梅冬徐慢赵修建

【Author】 XIA Donglin~1 LIU Meidong~2 XU Man~1 ZHAO Xiujian~1 (1 Key Laboratory for Silicate Materials Science and Engineering of Ministry of Education, Wuhan University of Technology, Wuhan 430070, China; 2 Department of Electronics Science and Technology, Huazhong University of Science and Technology, Wuhan 430074, China)

【机构】 武汉理工大学硅酸盐材料工程教育部重点实验室华中科技大学电子科学与技术系武汉理工大学硅酸盐材料工程教育部重点实验室 武汉 430070武汉 430074武汉 430070

【摘要】 铁电薄、厚膜材料具有良好的铁电、压电、热释电、电光及非线性光学特性,在微电子学、光电子学、集成光学和微电子机械系统等领域有许多重要的应用。近年来,随着铁电薄、厚膜制备技术的发展,PZT厚膜材料及厚膜器件成为科学工作者研究的热点。介绍了PZT铁电薄、厚膜材料与器件的研究进展以及PZT铁电薄、厚膜制备技术及几种典型的PZT铁电薄、厚膜材料制备技术的特点,并指出了目前存在的一些问题和未来的发展方向。

【Abstract】 Ferroelectric thin/thick films have excellent ferroelectric, piezoelectric, pyroelectric, electric-optic,acoustooptic and nonlinear optic properties. They have many important applications in some fields such as microelectronics, optoelectronics, integrated optics and micro-electro-mechanical system(MEMS). In recent years, with the development of preparation techniques of ferroelectric thin/thick films, the research on PZT thin/thick films materials and devices has received much attention. Recent progresses on PZT ferroelectric materials and preparation technology of PZT ferroelectric thin films or thick films are reviewed, and some characteristics of preparation technology of PZT ferroelectric thin films or thick films. The paper also points out some existing problems and predicts future developmental directions.

【基金】 国家高技术研究发展计划新材料领域基金(863—715—002—0100)
  • 【分类号】TB383.2
  • 【被引频次】23
  • 【下载频次】496
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