节点文献
平面光电器件的纳米级高速研磨
High Speed Nanometer Lapping Photoelectric Elements
【摘要】 论文探讨了采用固着磨料高速研磨进行纳米级加工的有关问题。采用固着磨料高速研磨加工技术加工光电器件 ,使工件已加工表面粗糙度达Ra2 .88nm ,平面度达 19nm ,不仅实现了纳米级加工 ,而且还实现了高效率、低成本加工。
【Abstract】 In the paper, some problems about high speed nanometer l apping with solid abrasives was discussed.A high speed solid abrasives lapping t echnology was used for machining photoelectric elements. The result shown that t he surface roughness of workpiece reached to Ra288nm and flatness reached 19nm . The technology not only realized nanometer machining but also realized machini ng at high efficiency and low cost.
- 【文献出处】 长春理工大学学报 ,Journal of Changchun Institute of Optics and Fine Mechanics , 编辑部邮箱 ,2004年03期
- 【分类号】TG580.6
- 【被引频次】5
- 【下载频次】72