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用微波ECR等离子体增强磁控溅射沉积法在玻璃上镀膜

Preparation of Silicon Thin Films on Glass Surface Using Microwave ECR Plasma Source Enhanced Magnetron Sputtering

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【作者】 孙洪福汤华娟王承遇陶瑛邓新绿

【Author】 SUN Hongfu~1,TANG Huajuan~1,WANG Chengyu~1, TAO Ying~1,DENG Xinlu~2 (1. Institute of Glass and New Inorganic Material, Dalian Insaterial Modification by Laser, Ion and Electron Beams,Dalian University of Technology, Dalian 116024,China)

【机构】 大连轻工业学院玻璃及无机新材料研究所大连理工大学三束材料表面改性国家重点实验室 辽宁 大连 116034辽宁 大连 116034辽宁 大连 116024

【摘要】 利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。研究了所得硅膜的表面形貌、附着力和化学稳定性及其红外-可见光谱特性。结果表明此法制备的硅膜均匀性好,附着力及化学稳定性高,对近红外波段有较低的透过率和较高的反射率。

【Abstract】 The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering. The surface structure,adhesion,chemical durability and visible-infrared spectra of the films were studied. It indicates that the films have smooth surface,high adhesion and chemical stability. It also has low transmittance and high reflectivity in near infrared region.

  • 【分类号】TQ171.6
  • 【被引频次】10
  • 【下载频次】258
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