节点文献
用微波ECR等离子体增强磁控溅射沉积法在玻璃上镀膜
Preparation of Silicon Thin Films on Glass Surface Using Microwave ECR Plasma Source Enhanced Magnetron Sputtering
【摘要】 利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。研究了所得硅膜的表面形貌、附着力和化学稳定性及其红外-可见光谱特性。结果表明此法制备的硅膜均匀性好,附着力及化学稳定性高,对近红外波段有较低的透过率和较高的反射率。
【Abstract】 The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering. The surface structure,adhesion,chemical durability and visible-infrared spectra of the films were studied. It indicates that the films have smooth surface,high adhesion and chemical stability. It also has low transmittance and high reflectivity in near infrared region.
【关键词】 玻璃表面;
硅膜;
磁控溅射;
微波;
等离子体;
【Key words】 Glass surface; Silicon thin film; Magnetron sputtering; Microwave; Plasma;
【Key words】 Glass surface; Silicon thin film; Magnetron sputtering; Microwave; Plasma;
- 【文献出处】 玻璃与搪瓷 ,Glass & Enamel , 编辑部邮箱 ,2004年02期
- 【分类号】TQ171.6
- 【被引频次】10
- 【下载频次】258