【摘要】 介绍了一套基于相位冲突图的生成和处理的新方法 ,可以准确、全面地对由传统方法设计的标准单元版图(暗场 )进行检查 .基于此方法的软件工具能够检查标准单元版图 ,找出不符合交替移相掩模设计要求的图形 ,并给出相关的修改建议 .实验结果证实了该工具的有效性更多还原

【Abstract】 Based on generation and processing of phase conflict graph,a new method is presented to fully and accurately verify the phase compatibility of dark field standard cell layouts,which are produced according to conventional design rules.A software implementing this method is presented as well,which has the capabilities of verifying standard cell layout,locating features with phase conflicts and giving out suggestions for modification.Experiment results show the effectiveness of this useful tool.更多还原