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p沟道锗/硅异质纳米结构MOSFET存储器及其逻辑阵列
p-Channel Ge/Si Hetero-Nanocrystal Based MOSFET Memoryand Its Logic Array
【摘要】 采用巴丁 (Bardeen)传输哈密顿方法 ,数值计算了 p沟道锗 /硅异质纳米结构存储器的时间特性 .由于台阶状隧穿势垒和较高价带带边的作用 ,这种新型的存储器单元可以同时实现器件的快速编程和长久存储 ,具有优异的存储特性 .以 2× 2逻辑阵列为例说明了这类存储器单元组成逻辑电路的设计原理 .研究结果表明 :这种器件可以作为在室温下工作的性能优异的非易失性存储器单元 ,有望在将来的超大规模集成电路中获得应用 .
【Abstract】 Basing on Bardeen’s transfer Hamiltonian formalism,the charge storage characteristics of p-channel Ge/Si hetero-nanocrystal based MOSFET memory is simulated.Owing to the advantages of a compound potential well and a higher offset in the valence band,this kind of memory can possess the advantages of both high-speed programming and long retention simultaneously,and thus it has the well storage characteristics.Furthermore,a 2×2 logical array is used to illustrate the principle of logical.Therefore,this kind of device,as an excellent nonvolatile memory operating at room temperature,is desired for the applications in the future VLSI.
【Key words】 Ge/Si; hetero-nanocrystal; memory; hole tunneling; simulation;
- 【文献出处】 半导体学报 ,Chinese Journal of Semiconductors , 编辑部邮箱 ,2004年02期
- 【分类号】TN386.1
- 【被引频次】4
- 【下载频次】97