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Cu块材及Cu膜的光学常数研究
A study on the optical constants of Cu bulk and Cu films
【摘要】 用反射式动态椭圆偏振光谱技术对Cu块材、Cu薄膜及Cu厚膜的光学常数进行了测试分析。研究结果表明:与Roberts块材、Johnson厚膜数据相比,不同方法得到Cu的光学常数在谱线形状上基本相似,但在数值上存在一定差别;在波长为250~830nm范围内,Cu块材和膜的折射率n与消光系数k分别在0.1~1.5和1.5~5.0之间;随膜厚增加,n值增大,k值减小;厚膜的n、k值与块材的更为接近。同时讨论了光学常数与微结构的关系。
【Abstract】 The optical constants of Cu bulk and sputtering Cu films were studied in details by employing a reflecting spectroscopic ellipsometer. The results show that our n, k curves are identical on the whole in shape but different in numeric value comparing with Robert’s bulk data and Johnson’s thick film data. In the range of 250~830nm, the refractive index n for Cu bulk and films varies between 0.1 and 1.5, and the extinction coefficient k varies from 1.5 to 5.0. As film thickness increases n raises and k reduces. The optical constants of thick film are closer to those of bulk. The relation between optical constants and microstructure is discussed as well.
【Key words】 Cu bulk; Cu films; spectroscopic ellipsometry; optical constants; microstructure;
- 【文献出处】 安徽大学学报(自然科学版) ,Journal of Anhui University(Natural Sciences) , 编辑部邮箱 ,2004年02期
- 【分类号】O484.4
- 【被引频次】14
- 【下载频次】243