【摘要】 用激光脉冲沉积技术生长、制备出了一系列不同真空度、不同衬底温度和不同激光脉冲能量的MgO薄膜。对生长、制备出的一系列MgO薄膜进行了椭偏光谱测量研究,在300~800nm光谱波长范围内,得到了不同条件下生长制备的MgO薄膜的光学常数谱和膜厚,其结果显示:真空度、衬底温度和激光脉冲能量对生长MgO薄膜的折射率、膜厚均有影响,高真空、高衬底温度和适中的激光脉冲能量有利于生长制备高折射率、高密度和高质量的MgO薄膜。更多还原

【Abstract】 MgO thin films deposited on si (100) substrate have been prepared by pulsed laser deposition (PLD) at different conditions. The ellipsometric spectra of the MgO films have been obtained in the spectral range of 300 ~ 800 nn, and their optical constants and thickness are determined from the ellipsometric spectra. The optical constants and thickness of MgO films can be affected by the growth condition, and the results show that the higher vacuum, the higher substrate’s temperature and suitable laser energy is good for getting higher refractive index, higher density and good quality MgO thin films.更多还原