节点文献

Zn_0.85Co_0.15O薄膜的制备及其结构分析

Growth and Microstructures of Zn₀.85Co₀.15 O Films

推荐 CAJ下载
PDF下载
不支持迅雷等下载工具，请取消加速工具后下载。

【Author】 Li Aixia,Su Fenglian,Zhou Shengming ,Liu Yanmei and Zhao Zongyan ( Department of Physics of Anhui University, Hefei, 230039, China)

【机构】安徽大学物理系；安徽大学物理系安徽合肥 230039；安徽合肥 230039；安徽合肥 230039教授；安徽合肥 230039；

【摘要】用电子束蒸镀方法在(100)单晶Si衬底上,生长Zn0.85Co0.15O薄膜,并研究了衬底温度对薄膜质量的影响,结果表明当衬底温度为400℃时,外延膜取向性最好,且其(002)衍射峰半高宽最窄(为0.4834°)。更多还原

【Abstract】 Zn0.85Co0.15O Films were grown on Si(100) substrates by reactive electron beam evaporation. Its microstructures were characterized with X-ray diffraction (XRD) .We found that substrate temperature strongly affects the film quality and al a substrate temperature of 400℃highly c-axis oriented grains dominate in the film, with the narrowest(002) X-ray diffraction peak width of (0.4834°).更多还原