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用射频磁控溅射法在二氧化硅衬底上制备磁光Ce∶YIG薄膜
Growth of Magneto-optic Ce-substituted YIG Thin Films on AmorphousSilica Substrated by RF Magnetron Sputtering
【摘要】 使用射频磁控溅射法在非晶态的二氧化硅衬底上制备Ce1YIG磁光薄膜。生成的Ce1YIG薄膜为非晶态形式 ,经过后续的热处理过程 ,转变为晶化薄膜 ,在用波长为 6 30nm的激光测量时 ,薄膜的饱和法拉弟旋转系数θF 为 80 0°/mm。晶化薄膜具有很强的平行于膜面的磁化强度 ,用VSM测得晶化薄膜的居里温度为 2 2 0℃。实验结果表明 :所制备的薄膜适宜于制备波导型磁光隔离器。同时 ,这一方法为进一步研究非互易平面光波回路打下了基础
【Abstract】 Ce substituted yttrium iron garnet(Ce 1YIG) films were grown on amorphous silica substrates by RF magnetron sputtering.The as grown amorphous films become crystallized after appropriate annealing.The saturation Faraday rotation coefficient, θ F,was found to be about 800°/mm for the 630 nm laser light.Strong in plane magnetization was observed and the Curie temperature of the crystal films was measured to be 220 ℃ with VSM technique in atmosphere.The results also show that Ce 1YIG can be useful material to fabricate non reciprocal wave guide devices,for instance,inteqrated optics isolators.
【Key words】 Ce substituted YIG; Faraday rotation; Magneto optic; Magnetic properties; Silica substrate;
- 【文献出处】 真空科学与技术 ,Vacuum Science and Technology , 编辑部邮箱 ,2003年02期
- 【分类号】O484.43
- 【被引频次】9
- 【下载频次】210