【摘要】 分析了智能型纳米级抛光机运动的设计原理 ,使工件加工表面各点相对于抛光盘的抛光线速度相等 ,且工件表面各点运动轨迹不重复 ;提出了“低速起动—无级提速—恒速加工—低速修整—低速停止”的加工运动模式 ,采用光栅测量和微机控制技术 ,将抛光盘总转数的精度控制在± 0 .5°以内 ,保证加工余量去除误差在 1nm以内 ,结合合理的加工工艺 ,获得晶片极高的平面度和无损伤超平滑表面更多还原

【Abstract】 The motion design principle of the intelligent polishing machine at nanometerlevel has been analyzed, by having the equally spaced points on the machining surface of the workpiece relatively to the polishing line speed of the polishing disk, and the motion tracks of every point being not repeat, the motion mode of "low-speed start-step less acceleration-constant speed polishing-low-speed trimming-low-speed stop"has been proposed. Through using grating measurement and computer controlling technology, the accuracy of the total revolution of the polishing disk is controlled within (0.5(to ensure the removalerror of the polishing allowancewithin 1nm, and combining reasonable polishing technology, very good flatness and ultra-smooth surface without damage of the wafer can be obtained.更多还原