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FABRICATION AND CHARACTERATION OF NANOPOROUS SILICA FILM

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【Author】 Yin Mingzhi , Zhang Liangying, Yao Xi Electronic Materials Research Laboratory, Xi’an Jiaotong University,Xi’an 710049, China.

【机构】 Electronic Materials Research Laboratory； Xi’an Jiaotong University； Xi’an 710049； China； China；

【Abstract】 Colloidal silica sol is formed by a novel hydrolyzing procedure of tetraethyl orthosilicate(TEOS) catalyzing with NH 3 ·H 2 O in aqueous mediums. Glycerol, combining with the hydrolyzed intermediates of TEOS, controls growing of the silica particles; poly(vinyl vinyl alcohol makes the colloidal silica sol with polymeric structure and spinning, thermal strain makes the gel silica film changed into a nanoporous structure with diameter ranging 50-150 nm. Morphologies of the nanoporous silica film have been characterized; the porosities (%) is 32-64; the average dielectric constant at 1MHz region is 2.0 and 2.1; the thermal conductivity is less than 0.8. Chemical mechanism of the sol gel process is discussed.更多还原

【关键词】 tetraethylorthosilicate； sol gel technique； nanoporous silica film； thermal conductivity；
【Key words】 tetraethylorthosilicate； sol gel technique； nanoporous silica film； thermal conductivity；

【基金】 ThisworkwassupportedbytheNational973ProjectofChina(No.2002CB613305).ElectronicmaterialinstituteofXianJiaotongUniversity.

【文献出处】 Academic Journal of Xi’an Jiaotong University ,西安交通大学学报(英文版) , 编辑部邮箱 ,2003年02期

【分类号】TB383
【下载频次】31

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