【摘要】 以低铈混合氯化稀土为原料,NH3·H2O为沉淀剂,空气和H2O2为氧化剂,经选择性氧化沉淀、洗涤、烘干、煅烧制备用于光学玻璃抛光材料的超细CeO2前驱体。研究了氧化沉淀条件与加料方式对前驱体中氧化铈含量的影响,以及煅烧温度与前驱体粉末粒度、比表面和物相组成的相关关系。结果表明:采取正序滴加进料方式,控制沉淀过程pH值在4.5～5.5范围,可以使Ce3+氧化成Ce4+并形成氢氧化物沉淀而与其他稀土离子分离,沉淀物在600～700℃煅烧,得到CeO2含量大于80%,中位粒径D50小于1.5μm的超细CeO2抛光粉前驱体。更多还原

【Abstract】 The ultra-fine CeO2 precursor for optical glass polishing material was prepared by selective oxidation and precipitation, washing, drying and calcination from low-cerium complex rare earth chlorides solution with NH3.H2O as precipitator, air and H2O2 as oxidative agent.The effect of reaction conditions and feeding mode on the content of CeO2 in precursor,and the correlativity between calcination temperature and particle size,specific surface area and mineralogical composition of precursor powder were investigated.The results show that by forward dripping, pH value controlled within 4.5 and 5.5,Ce3+ can be oxidized into Ce4+ to form hydroxide precipitant,followed by separation with other RE ions the ultra-fine polishing powder and precipitation before calcinations at 600～700 ℃ to obtain ultra-fine CeO2 precursor with CeO2 content over 80%,median particle size D50 less than 1.5 μm.更多还原