【摘要】 采用正交试验设计方法优化反应条件制备了纯1阶结构的钾 四氢呋喃 石墨插层化合物(K THF GIC),研究了1阶K THF GIC在空气中放置、溶剂洗涤以及加热处理时的稳定性,并对K、THF嵌入石墨层间以及从石墨层间脱嵌的过程进行了探讨。结果表明:制备K THF GIC时,插层剂浓度和插层反应时间对产物结构的影响很大,较大的插层剂浓度,较长的反应时间有利于石墨反应完全;1阶K THF GIC的稳定性较差,K、THF容易从层间脱嵌,使得阶结构由1阶向高阶变化,高阶K THF GIC的稳定性相对1阶K THF GIC来说要好一些,即形成高阶K THF GIC后,K、THF从层间脱嵌的速率要慢些。更多还原

【Abstract】 By using orthogonal design to optimize reaction conditions, a stage 1 potassiumtetrahydrofurangraphite intercalation compound (KTHFGIC) was synthesized. A high concentration of intercalants and a long reaction time are favorable for the graphite to react completely and to form stage 1 KTHFGIC. The stability of stage 1 KTHFGIC was investigated by Xray diffraction. The results showed that K and THF deintercalated from the interlayer space of the graphite when stage 1 KTHFGIC was exposed to air, washed by solvent and heated, which was accompanied by formation of a higher stage KTHFGIC which is more stable than stage 1 KTHFGIC. The processes of K and THF intercalation into and deintercalation from the interlayer space of graphite were discussed.更多还原