【摘要】 介绍了掩模基片的技术要求,分析了制备掩模多层膜的难点以及相应的解决措施,然后讲解了吸收层干刻法制备掩模的工艺流程,最后介绍了掩模缺陷的检测技术并概述了极紫外投影光刻掩模技术的现状。更多还原

【Abstract】 The requirements for the mask substrate are described and the difficulties for fabricating the mask multilayer and their solutions are analyzed. Then the steps of patterning absorbing layers deposited on top of the multilayer reflectors are explained. Finally, the mask defect inspection technologies and the present status of EUVL mask are introduced.更多还原