【摘要】 在超高真空分子束外延 (MBE)生长技术中 ,反射式高能电子衍射仪 (RHEED)能实时显示半导体和金属外延生长过程 ,给出薄膜表面结构和平整度的信息 ,成为MBE必备的原位表面分析仪 .为了研究氧化物薄膜如高温超导(YBa2 Cu3 O7)、铁电薄膜 (Sr1 -xBaxTiO3 )及它们的同质和异质外延结构的生长机理 ,获得高质量的符合各种应用需要的氧化物多层薄膜结构 ,在常规的制备氧化物薄膜的脉冲激光沉积 (PLD)设备上配备适合在高气压制膜条件下使用的高气压反射式高能电子衍射仪 (high pressureRHEED) ,在国内首先实现氧化物薄膜生长过程的实时监控 .详细介绍了高气压反射式高能电子衍射仪的结构和特性 ,给出了碳酸锶 (SrTiO3 )基片上同质外延碳酸锶铌 (SrTiO3 +2 %Nb)和异质外延钇钡铜氧 (Y1 Ba2 Cu3 O7)薄膜生长过程中衍射图形和零级衍射强度震荡 .更多还原

【Abstract】 Reflection high\|energy electron diffraction (RHEED) is very surface sensitive a nd often used for the analysis and monitoring of thin film growth in ultrahigh v a cuum deposition system (for instance, Molecular Beam Epitasis). In order to in\| situ monitor the growth of oxide thin films at high oxygen pressure up to 50Pa, a high\|pressure RHEED designed and fabricated by our group was used for first time in our pulsed laser deposition system (PLD). Using the PLD system the Nb-doped SrTiO 3 (STNO) and Y 1Ba 2Cu 3O 7 (YBCO) thin films have been epitaxially grown on SrTiO 3 (001) substrates. The RHEED patterns of the STNO and YBCO films and the oscillation of the intensity of the pattern have been measured by the high-pressure RHEED during deposition. In addition,the surface morpholoyg of the films and the dynamic analysis of film growth process were discussed.更多还原