【摘要】 用电化学沉积法和自制的微机数控电化学电源,在半导体硅片等衬底上成功制备出Cu/Co等组分调制多层膜,利用EPMA、SEM、STM(AFM)、TEM多种方法表征其微结构。 电化学沉积实验表明,在较高过电压、较低电流密度和较低PH(≈1.8)等条件下,能获得GMR≥8%的纳米多层膜。更多还原

【Abstract】 The Cu/Co Nano-Multilayer Films by composition modulation on semi-conductor silicon were manufactured with electrochemical deposition and equipment by means of computer. His Microstructure characteristics were studied using EPMA,SEM,STM(AFM),TEM and the electro-deposition current-time curves. Films grown at high over-voltage, low current an low PH(≈1.8) exhibited giant magneto-resistance(GMR) of over 8%.更多还原