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Fe-Zr-B非晶薄膜退火后的组织与性能
Properties and Structures of Fe -Zr -B Amorphous Thin Fihns after Annealing
【摘要】 用直流磁控溅射法成功制备了Fe-Zr-B非晶薄膜。用X-射线衍射、透射电镜研究了薄膜不同退 火温度后的组织与性能。研究结果表明,薄膜在550℃退火时,其磁感应强度最高,主要原因是因为 其结构发生了有利于磁化的bcc相的转变。
【Abstract】 The amorphous Fe - Zr - B thin films have been prepared by DC magnetron sputtering. The properties and structures of it afrer annealing at different temperature has been studied by XRD and TEM. The Intensity of magnetizatin of Fe - Zr - B film after annealed at 550℃ is best due to transformation of structures to bcc phase advantageous to magnetizing.
- 【文献出处】 热处理 ,Heat Treatment , 编辑部邮箱 ,2003年04期
- 【分类号】TB43
- 【下载频次】66